| CAS No. | Name | Category | Project | Application |
|---|---|---|---|---|
| / | Argon-xenon-neon mixture | Semiconductors | Commercial | |
| / | Argon oxygen mixture | Semiconductors | Commercial | |
| / | Krypton neon mixture | Semiconductors | Commercial | |
| / | Helium ammonia mixture | Semiconductors | Commercial | |
| / | Fluorine nitrogen mixture | Semiconductors | Commercial | Fluorine-nitrogen mixtures (a mixture of fluorine and nitrogen) are primarily used in industrial sectors that require precise control of fluorine reactivity or the mitigation of operational risks, due to their unique chemical properties—namely, the high reactivity of fluorine and the diluting effect of inert nitrogen. Examples include monomer encapsulation, microelectronics manufacturing, the nuclear energy industry, the synthesis of specialty materials, and surface treatment and functional modification. |
| 685-63-2 | Hexafluoro-1,3-butadiene | Semiconductors | Commercial | Gases used in dry etching processes in the manufacture of large-scale integrated circuits. Synthetic resins and fluorinated substances. |
| 75-24-1 | Trimethylaluminum | Semiconductors | Available | Used as MOCVD/ALD precursor for semiconductor manufacturing, also applied as alkylation catalyst in organic synthesis, and precursor for preparation of alumina coating in lithium battery and perovskite cell. |
| Total: | 7 | |||